Integrated circuit fabrication: crystal growth and wafer preparation; epitaxial growth; oxidation, diffusion, and ion implantation; thin-film deposition techniques; lithography and etching processes; integrated circuit process integration and process simulation.
Prerequisite: Electrical Engineering 339 with a grade of at least C-; and credit with a grade of at least C- or registration for Aerospace Engineering 333T, Biomedical Engineering 333T, Chemical Engineering 333T, Civil Engineering 333T, Electrical Engineering 333T, Mechanical Engineering 333T, or Petroleum and Geosystems Engineering 333T.
Meets with EE 396K (Topic 8).