EE 340P: High -Throughput Nanopatterning

Explore sub-50nm fabrication using mechanical patterning techniques. Provide an overview of photolithography, mechanical nanopatterning processes, hot embossing, and UV imprint lithography. Wafer-scale and roll-to-roll nanopatterning will be introduced with applications in electronics, photonics, and nanomedicine. Physics of nanoreplication, process limits, template (mold) fabrication, defect mechanisms, and factors affecting throughput will also be discussed. 

Course Level: 

Undergraduate

Prerequisites: 

Electrical Engineering 411 and 339, and Mathematics 427Kor 429J, with a grade of at least C- in each.