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Texas ECE Student Yibo Lin Receives Best Paper Award at SPIE Advanced Lithography

Texas ECE PhD student Yibo Lin received the Franco Cerrina Memorial Best Student Paper Award at SPIE Advanced Lithography 2016, held on February 21-25, 2016 in San Jose, California. SPIE Advanced Lithography has been a premier conference for the lithography community for 40 years. Lin was recognized for the paper "Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding," co-authored by Xiaoqing Xu, Texas ECE alumnus Bei Yu of The Chinese Univ. of Hong Kong, and Texas ECE professors Ross Baldick and David Z. Pan.