ECE Students Bei Yu and Jhih-Rong Gao Awarded BACUS Photomask Scholarships

Tuesday, August 27, 2013 - 9:45am

ECE graduate students Bei Yu and Jhih-Rong Gao, bothsupervised by Prof. David Pan, were awarded the BACUS Photomask Scholarship. This scholarship is awarded to an undergraduate or a graduate student in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies. This scholarship is sponsored by BACUS, SPIE's Photomask International Technical Group.