Texas ECE PhD student Yibo Lin received the Franco Cerrina Memorial Best Student Paper Award at SPIE Advanced Lithography 2016, held on February 21-25, 2016 in San Jose, California. SPIE Advanced Lithography has been a premier conference for the lithography community for 40 years. Lin was recognized for the paper "Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding," co-authored by Xiaoqing Xu, Texas ECE alumnus Bei Yu of The Chinese Univ. of Hong Kong, and Texas ECE professors Ross Baldick and David Z. Pan.