UT ECE Student Fei Xue and Prof. Jack Lee Win Nicollian Award

Wednesday, December 15, 2010 - 6:00pm

UT ECE student Fei Xue and Prof. Jack Lee received the Nicollian Award for best paper in IEEE Semiconductor Interface Specialists Conference SISC 2010. The award was for work on "InAs and In0.7Ga0.3As buried channel MOSFETs with ALD gate dielectrics" with H. Zhao, Y. Chen, Y. Wang, F. Zhou, and J. Lee.

The SISC Ed Nicollian Award for best student paper was established in 1995 in honor of Professor E.H. Nicollian, University of North Carolina at Charlotte. Professor Nicollian was a pioneer in the exploration of the metal-oxide-semiconductor system, particularly in the area of electrical measurements. His efforts were fundamental to establishing the SISC in its early years, and he served as its technical program chair in 1982. With John Brews, he wrote the definitive book, MOS Physics and Technology, published by Wiley Interscience.

Fei is supervised by Prof. Jack Lee.